Published at : 30 Dec 2015
Volume : IJtech
Vol 6, No 6 (2015)
DOI : https://doi.org/10.14716/ijtech.v6i6.1305
Moraru, D., Tyszka, K., Takasu, Y., Samanta, A., Mizuno, T., Jablonski, R., Tabe, M., 2015. Physics of Strongly-coupled Dopant-atoms in Nanodevices. International Journal of Technology. Volume 6(6), pp. 1057-1064
Daniel Moraru | Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Hamamatsu, Japan |
Krzysztof Tyszka | Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Hamamatsu, Japan |
Yuki Takasu | Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Hamamatsu, Japan |
Arup Samanta | Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Hamamatsu, Japan |
Takeshi Mizuno | Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Hamamatsu, Japan |
Ryszard Jablonski | Institute of Metrology and Biomedical Engineering, Warsaw Univ. of Technology, Sw. A. Boboli 8, Warsaw, Poland |
Michiharu Tabe | Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Hamamatsu, Japan |
In silicon nanoscale transistors, dopant atoms can significantly affect the transport characteristics, in particular at low temperatures. Investigation of coupling between neighboring dopants in such devices is essential in defining the properties for transport. In this work, we present an overview of different regimes of inter-dopant coupling, controlled by doping concentration and a selective doping process. Tunneling-transport spectroscopy can reveal the fundamental physics of isolated dopants in comparison with strongly-coupled dopants. In addition, observations of surface potential for Si nano-transistors can provide direct access to understanding the behavior of coupled dopants.
Dopant atoms, Nanoscale, Quantum dot, Silicon, Tunneling transport
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